Multilayers on Extreme Ultraviolet Lithography Masks and Illumination Error;
极紫外投影光刻掩模的多层膜与照明误差
Fabrication of continuous relief mask for diffractive plane focus lens;
连续型平面衍射聚光透镜掩模的制作
A Novel GMTI Method Based on Masking Technique;
一种利用掩模法抑制杂波的GMTI方法
mask programmable integration
掩模可编程序集成电路
Hard surface photomask substrates
GB/T15871-1995硬面光掩模基板
electron beam generated mask
电子束技术制造的掩模
hard-surface in-contact mask
表面坚固内接触掩模
electron beam mask generator
电子束掩模图象发生器
mask program read-only memory
掩模程序只读存储器
photoresist mask pattern
光致抗蚀剂掩模图形
electron beam mask system
电子束掩模制造系统
mask programmable memory
掩模可编程序存储器
trench mask definition
槽腐蚀用掩模图象形成
electron chrome mask
电子束光刻用铬掩模
masking clean / etch statio
掩模板清洗[腐蚀]台
fixed-mask type ROM
固定掩模型只读存储器
computer aided mask preparation
计算机辅助掩模制备
Chromium masks last1 o to100 times longer than the emulsion masks.
铬掩模的使用寿命比乳效掩模的长10~00倍.
Chromium masks last 1o to 100 times longer than the emulsion masks.
铬掩模的使用寿命比乳效掩模的长10~100倍.
Act of moving a mask or reticle to match up alignment marks.
对准,调整掩模和晶片之间的位置。
Specification for round quartz photomask substrates
GB/T16523-1996圆形石英玻璃光掩模基板规范
